Difference between revisions of "NOCC"
From mn.fysikk.laglivlab
(Tag: Visual edit) |
(Tag: Visual edit) |
||
| Line 3: | Line 3: | ||
== Protocols == | == Protocols == | ||
| + | |||
| + | == Short summary == | ||
| + | '''Progress September 2023 - June 2024''' | ||
| + | |||
| + | Stenciling techniques proves to work best when the intern-pattern distance is roughly 50 microns. Anything smaller than that becomes difficult to make a stencil out of, regardless of the glue used or slight improvements in the technique. | ||
| + | |||
| + | After testing out micropatterning using stenciling using patterns with big features, we were able to get some data of MDCK motion confined by circular or square patches. AAD started preparing wafers with patterns of smaller features, such as the topological patterns inspired by https://journals.aps.org/pre/abstract/10.1103/PhysRevE.103.022703 amongst other papers. | ||
Revision as of 13:31, 19 June 2024
Experimental notes
Protocols
Short summary
Progress September 2023 - June 2024
Stenciling techniques proves to work best when the intern-pattern distance is roughly 50 microns. Anything smaller than that becomes difficult to make a stencil out of, regardless of the glue used or slight improvements in the technique.
After testing out micropatterning using stenciling using patterns with big features, we were able to get some data of MDCK motion confined by circular or square patches. AAD started preparing wafers with patterns of smaller features, such as the topological patterns inspired by https://journals.aps.org/pre/abstract/10.1103/PhysRevE.103.022703 amongst other papers.
