Difference between revisions of "Photolitho20240619 - MP"
From mn.fysikk.laglivlab
(Created page with "GM1060, 5um, wafer 1: plasma treatment >8 mins wafer 2: 135 C 20 mins chemical safety precaution: maybe need a bigger funnel?") |
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GM1060, 5um, | GM1060, 5um, | ||
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wafer 1: plasma treatment >8 mins | wafer 1: plasma treatment >8 mins | ||
| + | |||
wafer 2: 135 C 20 mins | wafer 2: 135 C 20 mins | ||
| − | + | ||
| + | 65-5, 95-30 | ||
| + | |||
| + | UV-kub-2: 25%, 4 cycles of 4sec | ||
| + | |||
| + | 65-5, 95-20 | ||
| + | |||
| + | Fresh PGMEA, shake, 1 min | ||
| + | |||
| + | Submerge in IPA, rinse | ||
| + | |||
| + | Result: small features are well observed | ||
| + | |||
| + | Chemical safety precaution: keep all PGMEA-contacted waste inside hood, The hood sash should be raised higher than the thick black line with arrow. | ||
| + | |||
| + | Most frequent chance of spill: 1-during washing of PGMEA, left hand (holding the wafer) will be in contact. | ||
| + | |||
| + | 2-when pouring the waste to bottles, PGMEA is spilled outside of the bottle. | ||
| + | |||
| + | Maybe need a bigger funnel? Or a glass container with a spout? | ||
Revision as of 17:52, 19 June 2024
GM1060, 5um,
wafer 1: plasma treatment >8 mins
wafer 2: 135 C 20 mins
65-5, 95-30
UV-kub-2: 25%, 4 cycles of 4sec
65-5, 95-20
Fresh PGMEA, shake, 1 min
Submerge in IPA, rinse
Result: small features are well observed
Chemical safety precaution: keep all PGMEA-contacted waste inside hood, The hood sash should be raised higher than the thick black line with arrow.
Most frequent chance of spill: 1-during washing of PGMEA, left hand (holding the wafer) will be in contact.
2-when pouring the waste to bottles, PGMEA is spilled outside of the bottle.
Maybe need a bigger funnel? Or a glass container with a spout?
