Difference between revisions of "Photolitho20240619 - MP"
From mn.fysikk.laglivlab
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| − | GM1060, 5um, | + | GM1060, 5um, 4120 rpm-40sec |
wafer 1: plasma treatment >8 mins | wafer 1: plasma treatment >8 mins | ||
wafer 2: 135 C 20 mins | wafer 2: 135 C 20 mins | ||
| + | |||
| + | (Spin coater setting was changed, there was no program 1- slow speed 400 rpm for 20 sec) | ||
65-5, 95-30 | 65-5, 95-30 | ||
Revision as of 17:54, 19 June 2024
GM1060, 5um, 4120 rpm-40sec
wafer 1: plasma treatment >8 mins
wafer 2: 135 C 20 mins
(Spin coater setting was changed, there was no program 1- slow speed 400 rpm for 20 sec)
65-5, 95-30
UV-kub-2: 25%, 4 cycles of 4sec
65-5, 95-20
Fresh PGMEA, shake, 1 min
Submerge in IPA, rinse
Result: small features are well observed
Chemical safety precaution: keep all PGMEA-contacted waste inside hood, The hood sash should be raised higher than the thick black line with arrow.
Most frequent chance of spill: 1-during washing of PGMEA, left hand (holding the wafer) will be in contact.
2-when pouring the waste to bottles, PGMEA is spilled outside of the bottle.
Maybe need a bigger funnel? Or a glass container with a spout?
