Difference between revisions of "20210503 photolitho"
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Dagkd@uio.no (talk | contribs) (Created page with "* cleaned wafers with plasma only * 1st wafer ** 3100 RPM ~ 25 um ** prebake on programmable hot plate ** Masking with UV-Kub 2. UV at 11% intensity for 30 sec. ** Hot plate...") |
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** The hot plate seems to take longer than the timer on my telephone. This needs to be checked! | ** The hot plate seems to take longer than the timer on my telephone. This needs to be checked! | ||
** development with PGMEA for 2:45 was too long time! Misjudged the residue and continued another 30s, then it was completely destroyed. | ** development with PGMEA for 2:45 was too long time! Misjudged the residue and continued another 30s, then it was completely destroyed. | ||
− | * 2nd wafer 3100 RPM ~ 25 um | + | * 2nd wafer Dag's pattern |
+ | ** 3100 RPM ~ 25 um | ||
** prebake on VWR hot plate, no nice control of ramp in temp | ** prebake on VWR hot plate, no nice control of ramp in temp | ||
** Masking with UV-Kub 2. UV at 11% intensity for 30 sec. | ** Masking with UV-Kub 2. UV at 11% intensity for 30 sec. | ||
** Postbake on VWR hotplate | ** Postbake on VWR hotplate | ||
** Developed 3min in PGMEA gave perfect sylinders and gaps between them. quick dip to remove a little residue and done. | ** Developed 3min in PGMEA gave perfect sylinders and gaps between them. quick dip to remove a little residue and done. |
Revision as of 13:21, 3 May 2021
- cleaned wafers with plasma only
- 1st wafer
- 3100 RPM ~ 25 um
- prebake on programmable hot plate
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- Hot plate too hot, 65C postbake happened at 72-66C
- The hot plate seems to take longer than the timer on my telephone. This needs to be checked!
- development with PGMEA for 2:45 was too long time! Misjudged the residue and continued another 30s, then it was completely destroyed.
- 2nd wafer Dag's pattern
- 3100 RPM ~ 25 um
- prebake on VWR hot plate, no nice control of ramp in temp
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- Postbake on VWR hotplate
- Developed 3min in PGMEA gave perfect sylinders and gaps between them. quick dip to remove a little residue and done.