Difference between revisions of "20210503 photolitho"

Revision as of 13:32, 3 May 2021

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 ** prebake on programmable hot plate
 **  Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
-** Hot plate too hot, 65C postbake happened at 72-66C
+** 10 minutes rest
-** The hot plate seems to take longer than the timer on my telephone. This needs to be checked!
+** post bake on VWR plate
-** development with PGMEA for 2:45 was too long time! Misjudged the residue and continued another 30s, then it was completely destroyed.
+* 2nd wafer
-* 2nd wafer Dag's pattern
 ** 3100 RPM ~ 25 um
 ** prebake on VWR hot plate, no nice control of ramp in temp
 **  Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
-** Postbake on VWR hotplate
+** Postbake on programmable hotplate
-** Developed 3min in PGMEA gave perfect sylinders and gaps between them. quick dip to remove a little residue and done.
+** Developed 2:30 min in PGMEA