Difference between revisions of "20210505 photolitho"
From mn.fysikk.laglivlab
(Tag: Visual edit) |
(Tag: Visual edit) |
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| Line 6: | Line 6: | ||
** post bake on VWR plate | ** post bake on VWR plate | ||
** > 10 minutes rest | ** > 10 minutes rest | ||
| − | ** Developed | + | ** Developed 3 min in PGMEA, |
** 2h hard bake at 135C | ** 2h hard bake at 135C | ||
* 2nd wafer | * 2nd wafer | ||
| Line 15: | Line 15: | ||
** Postbake on VWR hotplate | ** Postbake on VWR hotplate | ||
** X minutes rest | ** X minutes rest | ||
| − | ** Developed | + | ** Developed 4 min in PGMEA. |
Revision as of 13:24, 5 May 2021
- cleaned wafers with plasma oDag's patterns
- 1700 RPM (1700 programmed) ~ 50 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at 25% intensity for 18 sec. Distance 680 um
- > 10 minutes rest
- post bake on VWR plate
- > 10 minutes rest
- Developed 3 min in PGMEA,
- 2h hard bake at 135C
- 2nd wafer
- 900 RPM (970 in program) ~ 100 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at 25% intensity for 22 sec. Distance 730um
- >10 minutes rest
- Postbake on VWR hotplate
- X minutes rest
- Developed 4 min in PGMEA.
