Difference between revisions of "Photolitho20231109"
From mn.fysikk.laglivlab
Dagkd@uio.no (talk | contribs) (Created page with "* Cleaned 2 wafers with acetone, isopropanol + hot plate * 1 wafer: the SU8 did not spread well. We need a spatula for spreading SU8 * Cleaned another wafer with isopropanol +...") |
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* Cleaned 2 wafers with acetone, isopropanol + hot plate | * Cleaned 2 wafers with acetone, isopropanol + hot plate | ||
| − | * 1 wafer: the SU8 did not spread well. We need a spatula for spreading SU8 | + | * 1 wafer: the SU8 did not spread well (discarded). We need a spatula for spreading SU8 |
* Cleaned another wafer with isopropanol + plasma | * Cleaned another wafer with isopropanol + plasma | ||
| − | * | + | *After SU8 spin coat and 1 hour rest, the second wafer appears multiple bubbles |
| + | *Thickness 50 um, so we used the parameters from Ali's protocol | ||
| + | * | ||
Revision as of 10:30, 22 November 2023
- Cleaned 2 wafers with acetone, isopropanol + hot plate
- 1 wafer: the SU8 did not spread well (discarded). We need a spatula for spreading SU8
- Cleaned another wafer with isopropanol + plasma
- After SU8 spin coat and 1 hour rest, the second wafer appears multiple bubbles
- Thickness 50 um, so we used the parameters from Ali's protocol
