Difference between revisions of "Photolitho20240319 - MP"
From mn.fysikk.laglivlab
(Created page with "25 um using GM1070 Fixed the hotplate setting: will not start immediately after power on Used VWR (ramp6) for 3rd wafer, works well Used 2nd glass beaker for IPA washing after...") |
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25 um using GM1070 | 25 um using GM1070 | ||
| − | Fixed the hotplate setting: will not start immediately after power on | + | |
| − | Used VWR (ramp6) for 3rd wafer, works well | + | Bad: |
| − | Used 2nd glass beaker for IPA washing after development, wafer is clean and homogenous | + | |
| + | During the day, the emergency light was on 5 times. | ||
| + | |||
| + | Good: | ||
| + | |||
| + | Fixed the hotplate setting: it will not start immediately after power on | ||
| + | |||
| + | Used VWR (ramp6) for 3rd wafer, works well It's much faster than the hotplate. | ||
| + | |||
| + | Used 2nd glass beaker for IPA washing after development, wafer is clean and homogenous. | ||
Latest revision as of 17:41, 20 March 2024
25 um using GM1070
Bad:
During the day, the emergency light was on 5 times.
Good:
Fixed the hotplate setting: it will not start immediately after power on
Used VWR (ramp6) for 3rd wafer, works well It's much faster than the hotplate.
Used 2nd glass beaker for IPA washing after development, wafer is clean and homogenous.
