Difference between revisions of "NOCC"
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== Protocols == | == Protocols == | ||
Revision as of 21:09, 19 June 2024
Experimental notes
19.06.2024 - NA
20.06.2024 - NA
Protocols
Short summary
Progress September 2023 - June 2024
Stenciling techniques proves to work best when the intern-pattern distance is roughly 50 microns. Anything smaller than that becomes difficult to make a stencil out of, regardless of the glue used or slight improvements in the technique.
After testing out micropatterning using stenciling using patterns with big features, we were able to get some data of MDCK motion confined by circular or square patches. AAD started preparing wafers with patterns of smaller features, such as the topological patterns inspired by https://journals.aps.org/pre/abstract/10.1103/PhysRevE.103.022703 amongst other papers.
The next goal (as of 19th of June 2024) is to test stamping the patterns instead of stenciling them. NA will test out some protocols and will hopefully get better results than those with stenciling.
