Difference between revisions of "20210430 photolitho"
From mn.fysikk.laglivlab
Dagkd@uio.no (talk | contribs) (Created page with "* Started LAF-bench * N2 valve had been left open, no pressure left!") |
Dagkd@uio.no (talk | contribs) |
||
| Line 1: | Line 1: | ||
* Started LAF-bench | * Started LAF-bench | ||
| − | * N2 valve had been left open, no pressure left! | + | * N2 valve had been left open, almost no pressure left! |
| + | * cleaned wafers with plasma only | ||
| + | * 1st wafer | ||
| + | ** 3700 RPM ~ 20 um | ||
| + | ** prebake on programmable hot plate | ||
| + | * 2nd wafer 3100 RPM ~ 25 um | ||
| + | ** prebake on VWR hot plate, no nice control of ramp in temp | ||
Revision as of 09:56, 30 April 2021
- Started LAF-bench
- N2 valve had been left open, almost no pressure left!
- cleaned wafers with plasma only
- 1st wafer
- 3700 RPM ~ 20 um
- prebake on programmable hot plate
- 2nd wafer 3100 RPM ~ 25 um
- prebake on VWR hot plate, no nice control of ramp in temp
