Difference between revisions of "20210505 photolitho"
From mn.fysikk.laglivlab
Dagkd@uio.no (talk | contribs) (Created page with "* cleaned wafers with plasma oDag's patterns ** 1700 RPM (1700 programmed) ~ 50 um, 1h rest ** prebake on VWR hot plate ** Masking with UV-Kub 2. UV at X% intensity for 30 se...") |
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Revision as of 09:21, 5 May 2021
- cleaned wafers with plasma oDag's patterns
- 1700 RPM (1700 programmed) ~ 50 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at X% intensity for 30 sec.
- > 10 minutes rest
- post bake on VWR plate
- > 10 minutes rest
- Developed X min in PGMEA,
- 2h hard bake at 135C
- 2nd wafer
- 900 RPM (970 in program) ~ 100 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at X% intensity for 30 sec.
- >10 minutes rest
- Postbake on VWR hotplate
- X minutes rest
- Developed X min in PGMEA.
