Difference between revisions of "Oppsummering"
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**** fill with agar solution | **** fill with agar solution | ||
**** displace perfluorodecalin with cell media | **** displace perfluorodecalin with cell media | ||
| − | * Photolitho troubles | + | * Photolitho troubles, check out [https://www.elveflow.com/microfluidic-reviews/soft-lithography-microfabrication/su-8-mold-lithography/ Elveflow guides] |
** Systematically test different illumination doses on small patterns | ** Systematically test different illumination doses on small patterns | ||
** Clean isopropanol and PMGEA | ** Clean isopropanol and PMGEA | ||
** Clean wafers properly in acetone (or piranha) before plasma cleaning. Try corona plasma inside LAF bench in 219 to avoid exposure to dust before hot plate | ** Clean wafers properly in acetone (or piranha) before plasma cleaning. Try corona plasma inside LAF bench in 219 to avoid exposure to dust before hot plate | ||
Revision as of 12:05, 22 June 2021
- LowT agarose seems to be a workable starting gel for cells in 3D
- it's easy to prepare
- it can be mixed with collagen to give cells adhesive contacts
- filling parts of microfluidic circuits with gel
- 25 um thick SU8 worked fine with current patterns (30 um Ø posts)
- 25 um thick circuits became sufficiently hydrophobic after 3-4 days to keep flow within posts
- after 10-20 mm distance into circuit the flow resistance made the gel spill through the posts and into neighbouring areas
- => Plans/ideas
- shorter distances
- thicker channels, but this requires better photolitho or wider posts
- blocking fluid
- dissolve out unreticulated PDMS with pentane/hexane before oxidising. This will keep the PDMS hydrophilic for weeks
- fill neighbouring channels with perfluorodecalin (this is non-polar and will have a large contact angle with hydrophilic PDMS), see https://doi.org/10.1021/ac0346712
- fill with agar solution
- displace perfluorodecalin with cell media
- Photolitho troubles, check out Elveflow guides
- Systematically test different illumination doses on small patterns
- Clean isopropanol and PMGEA
- Clean wafers properly in acetone (or piranha) before plasma cleaning. Try corona plasma inside LAF bench in 219 to avoid exposure to dust before hot plate
