Photolitho20231109

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Revision as of 10:30, 22 November 2023 by Mengpa@uio.no (talk | contribs) (added more steps)

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  • Cleaned 2 wafers with acetone, isopropanol + hot plate
  • 1 wafer: the SU8 did not spread well (discarded). We need a spatula for spreading SU8
  • Cleaned another wafer with isopropanol + plasma
  • After SU8 spin coat and 1 hour rest, the second wafer appears multiple bubbles
  • Thickness 50 um, so we used the parameters from Ali's protocol