Photolitho20231109
From mn.fysikk.laglivlab
- Cleaned 2 wafers with acetone, isopropanol + hot plate
- 1 wafer: the SU8 did not spread well (discarded). We need a spatula for spreading SU8
- Cleaned another wafer with isopropanol + plasma
- After SU8 spin coat and 1 hour rest, the second wafer appears multiple bubbles
- Thickness 50 um, so we used the parameters from Ali's protocol