20210503 photolitho
From mn.fysikk.laglivlab
Revision as of 15:35, 3 May 2021 by Dagkd@uio.no (talk | contribs)
- cleaned wafers with plasma only
- 1st wafer Dag's patterns
- 3100 RPM ~ 25 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- > 10 minutes rest
- post bake on VWR plate
- > 10 minutes rest
- Developed 2:30 min in PGMEA, perfectly developed
- 2h hard bake at 135C
- 2nd wafer Anniken and Dag's patterns
- 3100 RPM ~ 25 um, 1h rest
- prebake on programmable hot plate
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- >10 minutes rest
- Postbake on programmable hotplate
- 15 minutes rest
- Developed 2:30 min in PGMEA. Overdeveloped!
