20210505 photolitho
From mn.fysikk.laglivlab
Revision as of 15:19, 5 May 2021 by Janmal@uio.no (talk | contribs)
- cleaned wafers with plasma oDag's patterns
- 1700 RPM (1700 programmed) ~ 50 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at 25% intensity for 18 sec. Distance 680 um
- > 10 minutes rest
- post bake on VWR plate
- > 10 minutes rest
- Developed 3+2+3 min in PGMEA, and 1 min in new PGMEA
- There was a big difference between the various patterns in how the small features were developed. The mask has probably not been pressed firmly enough on the substrate.
- 2nd wafer
- 900 RPM (970 in program) ~ 100 um, 1h rest
- prebake on VWR hot plate
- Masking with UV-Kub 2. UV at 25% intensity for 22 sec. Distance 730um
- >10 minutes rest
- Postbake on VWR hotplate
- 10 minutes rest
- Developed 4 min in PGMEA.
