Photolitho20240619 - MP
From mn.fysikk.laglivlab
Revision as of 17:52, 19 June 2024 by Mengpa@uio.no (talk | contribs)
GM1060, 5um,
wafer 1: plasma treatment >8 mins
wafer 2: 135 C 20 mins
65-5, 95-30
UV-kub-2: 25%, 4 cycles of 4sec
65-5, 95-20
Fresh PGMEA, shake, 1 min
Submerge in IPA, rinse
Result: small features are well observed
Chemical safety precaution: keep all PGMEA-contacted waste inside hood, The hood sash should be raised higher than the thick black line with arrow.
Most frequent chance of spill: 1-during washing of PGMEA, left hand (holding the wafer) will be in contact.
2-when pouring the waste to bottles, PGMEA is spilled outside of the bottle.
Maybe need a bigger funnel? Or a glass container with a spout?
