20210430 photolitho
From mn.fysikk.laglivlab
Revision as of 09:56, 30 April 2021 by Dagkd@uio.no (talk | contribs)
- Started LAF-bench
- N2 valve had been left open, almost no pressure left!
- cleaned wafers with plasma only
- 1st wafer
- 3700 RPM ~ 20 um
- prebake on programmable hot plate
- 2nd wafer 3100 RPM ~ 25 um
- prebake on VWR hot plate, no nice control of ramp in temp
