20210430 photolitho
From mn.fysikk.laglivlab
Revision as of 13:15, 3 May 2021 by Dagkd@uio.no (talk | contribs)
- Started LAF-bench
- N2 valve had been left open, almost no pressure left!
- cleaned wafers with plasma only
- 1st wafer
- 3700 RPM ~ 20 um
- prebake on VWR plate
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- 10 minutes rest
- post bake on VWR plate
- development with PGMEA for 2:30
- 2nd wafer
- 3100 RPM ~ 25 um
- prebake on programmable hot plate
- Masking with UV-Kub 2. UV at 11% intensity for 30 sec.
- Postbake on programmable hotplate
- Developed 2:30 min in PGMEA
