20210309

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Revision as of 11:13, 9 March 2021 by Dagkd@uio.no (talk | contribs) (start)

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Continued from yesterday

  • Had left the insolated wafer on the hot plate over night. This means 15 hours rest instead of 10 min.
  • Table says 5 min develop.
  • I used new PGMEA
  • After 3 minutes I noticed white structures in the region around the main structures. I did not understand what this signified
  • After 5 min I rinsed with isopropanol (IP)
  • I struggled to get good view in the microscope. Therefore I miscalculated what I saw and thought I needed to develop more.
  • I developed about 30 s more.
  • In the microscope it was now clear that the structures where overdeveloped and all the smallest features where erased.
This wafer was overdeveloped

Time to start again

New try

  • Use new wafer and go straight for plasma cleaning
  • Skip heating and do spinning