Difference between revisions of "20210713 lithography"
From mn.fysikk.laglivlab
(Created page with "=== Lithography === === Passaging === - We passaged once again. P-44 - Today we only replaced the growth medium, and did nothing else with the flask. There were very few cel...") (Tag: Visual edit) |
(→Passaging) (Tag: Visual edit) |
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=== Lithography === | === Lithography === | ||
| + | We prepared 2 50um silicon wafers. | ||
| + | |||
| + | - Followed the procedure for 50um wafers. Pre-baked at 65 degrees C for 15 min and then at 95 degrees C for 120 min. We did not have a way to adjust the ramping of the temperature of the heating plate, so we just let the wafer sit on the plate until it heated to the necessary temperature. | ||
=== Passaging === | === Passaging === | ||
- We passaged once again. P-44 | - We passaged once again. P-44 | ||
| − | - Today we only replaced the growth medium, and did nothing else with the flask. There were very few cells in the flask. | + | - Today we only replaced the growth medium, and did nothing else with the flask. There were very few cells in the flask, if any at all. :( |
Revision as of 13:43, 13 July 2021
Lithography
We prepared 2 50um silicon wafers.
- Followed the procedure for 50um wafers. Pre-baked at 65 degrees C for 15 min and then at 95 degrees C for 120 min. We did not have a way to adjust the ramping of the temperature of the heating plate, so we just let the wafer sit on the plate until it heated to the necessary temperature.
Passaging
- We passaged once again. P-44
- Today we only replaced the growth medium, and did nothing else with the flask. There were very few cells in the flask, if any at all. :(
