Difference between revisions of "20220308 photolitho"
From mn.fysikk.laglivlab
Dagkd@uio.no (talk | contribs) (Created page with "Started 08:30 following procedure. * New box of 3" wafers, cleaned with IP and N2, * plasma cleaning 1 min 100%") |
Dagkd@uio.no (talk | contribs) |
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* New box of 3" wafers, cleaned with IP and N2, | * New box of 3" wafers, cleaned with IP and N2, | ||
| − | * plasma cleaning | + | * plasma cleaning ~3 min (100 on timer setting) 100% |
| + | * on VWR hot plate 09:30 set to 150C | ||
Revision as of 10:37, 8 March 2022
Started 08:30 following procedure.
- New box of 3" wafers, cleaned with IP and N2,
- plasma cleaning ~3 min (100 on timer setting) 100%
- on VWR hot plate 09:30 set to 150C
