20220308 photolitho
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Revision as of 10:37, 8 March 2022 by Dagkd@uio.no (talk | contribs)
Started 08:30 following procedure.
- New box of 3" wafers, cleaned with IP and N2,
- plasma cleaning ~3 min (100 on timer setting) 100%
- on VWR hot plate 09:30 set to 150C