Difference between revisions of "Photolithography"
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=== [[Mathias' process|Mathias Busek's protocol 2020]] === | === [[Mathias' process|Mathias Busek's protocol 2020]] === | ||
=== [[UV KUB|UV KUB programming]] === | === [[UV KUB|UV KUB programming]] === | ||
− | === Important notes === | + | === Important notes 05.03.2021 === |
− | |||
* UV doses in the tables are too large. Look at comments in Matias Busek's protocol | * UV doses in the tables are too large. Look at comments in Matias Busek's protocol | ||
* The programmable hotplate is not reliable | * The programmable hotplate is not reliable |
Revision as of 16:04, 3 May 2021
Contents
SU8 process (square features)
Full description of process
A Simplified Version
Mathias Busek's protocol 2020
UV KUB programming
Important notes 05.03.2021
- UV doses in the tables are too large. Look at comments in Matias Busek's protocol
- The programmable hotplate is not reliable
- Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate.
- I have observed that the programmable hotplate seems to spend too long time at each step.