Difference between revisions of "Photolithography"
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Dagkd@uio.no (talk | contribs) (→Spin coater programming) (Tag: Visual edit) |
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=== [[Spin coater programming]] === | === [[Spin coater programming]] === | ||
| − | === Hot plate programming === | + | === [[Hot plate programming]] === |
=== Important notes 05.03.2021 === | === Important notes 05.03.2021 === | ||
Revision as of 15:03, 10 November 2023
Contents
Photolithography explained
SU8 process (square features)
Procedure updated Nov 2023
Handling of chemicals
Preparations the day before photolithography
Procedure notes before Nov 2023
Programming various equipment
UV KUB programming
Spin coater programming
Hot plate programming
Important notes 05.03.2021
- UV doses in the tables are too large. Look at comments in Matias Busek's protocol
- The programmable hotplate is not reliable
- Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate.
- I have observed that the programmable hotplate seems to spend too long time at each step.
