Difference between revisions of "Photolithography"

Revision as of 15:25, 10 November 2023

Open a new lab note here
- Note down your desired process
- As you go on the day, note all observations and final result
Decide how thick layer of SU8 you need
Choose right SU8 and protocol
- GM1060 for layers between 5-25µm. Full datasheet
- GM1070 for layers between 25-200µm. Full datasheet
Find and note the following parameters:
- Speed of spin-coater in rpm
- Pre- and post-bake times at 65 and 95 C, t_{65}, t_{95}
- Exposure dose
- PGMEA development time

UV doses in the tables are too large. Look at comments in Matias Busek's protocol
The programmable hotplate is not reliable
- Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate.
- I have observed that the programmable hotplate seems to spend too long time at each step.

@@ Line 8: / Line 8: @@
 ==== Preparations the day before photolithography ====
+* Open a new lab note here
+** Note down your desired process
+** As you go on the day, note all observations and final result
+* Decide how thick layer of SU8 you need
+* Choose right SU8 and protocol
+** GM1060 for layers between 5-25µm. Full datasheet
+** GM1070 for layers between 25-200µm.  Full datasheet
+* Find and note the following parameters:
+** Speed of spin-coater in rpm
+** Pre- and post-bake times at 65 and 95 C, t_{65}, t_{95}
+** Exposure dose
+** PGMEA development time
 === Procedure notes before Nov 2023 ===