Difference between revisions of "Photolithography"
From mn.fysikk.laglivlab
Dagkd@uio.no (talk | contribs) m (Tag: Visual edit) |
Dagkd@uio.no (talk | contribs) |
||
Line 5: | Line 5: | ||
=== [[Mathias' process|Mathias Busek's protocol 2020]] === | === [[Mathias' process|Mathias Busek's protocol 2020]] === | ||
=== [[UV KUB|UV KUB programming]] === | === [[UV KUB|UV KUB programming]] === | ||
+ | === Important notes === | ||
+ | |||
+ | * UV doses in the tables are too large. Look at comments in Matias Busek's protocol | ||
+ | * The programmable hotplate is not reliable | ||
+ | ** Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate. | ||
+ | ** I have observed that the programmable hotplate seems to spend too long time at each step. | ||
== XT process (rounded channels) == | == XT process (rounded channels) == |
Revision as of 15:48, 3 May 2021
Contents
SU8 process (square features)
Full description of process
A Simplified Version
Mathias Busek's protocol 2020
UV KUB programming
Important notes
- UV doses in the tables are too large. Look at comments in Matias Busek's protocol
- The programmable hotplate is not reliable
- Two times in a row the same procedure for 25 um thick substrate with VWR and programmable hot plates gave good results for VWR hotplate but overdevelopment for programmable hotplate.
- I have observed that the programmable hotplate seems to spend too long time at each step.